Semiconductor Equipment: Vacuum and Plasma Systems, Service and Parts
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BUY - SELL - LEASE - TRADE - SERVICE - PROCESS
The following are notes from the list provider:
Equipment Sales
- We completely rebuild systems, and offer them with a 90 day warranty. We also do special modifications on these systems. We can configure many of these systems to your specifications. A complete source inspection at our facility is possible. Please see the following lists of our current inventory.
Equipment Purchasing/Trade
- We will also buy your equipment, and take your systems in trade.
Equipment Spare Parts
- We carry many spare parts for the systems listed below, specifically Branson/IPC, Drytek, Gasonics, LFE, Technics, Tegal, etc. Also, we have vacuum related products and fluids, and RF Power Tubes.
Equipment Repair/Service
- We will completely rebuild your system at our facility, or service your system at your location. Our service rate plus travel expenses.
Plasma Processing
- We have equipment installed at our facility to do surface treating and cleaning of your parts. This service can usually be performed within 24 hours.
Note:
- All items included in the following table and list are subject to prior sale or availability upon time and date of inquiry.
Plasma Systems, Rebuilt
| Item
| Qty
| Description
| Condition
|
| 1
| 3 Ea
| Applied Materials Model 3300 PECVD system, Silicon Nitride and Silicon Dioxide films, Wafer capacity: 42 ea 3" wafers, 22 ea 4" wafers, 16 ea 5" wafers, ENI Model PS-300 RF Power Supply, 2000W @ 8111 KHz, 3 zone temperature control, Gas shower, Vacuum pumps, and filtration system.
| Rebuilt
|
| 2
| 1 Ea
| Branson Model L2101 Plasma /Asher/Etcher, 1 ea 12" x 20" quartz chamber, low particulate, 5 ea mass flow gas inputs, computer controlled w/ recipe storage of up to 350 process steps, temp controller, Model PM 332/ENI OEM 12 1000W solid state RF Generator.
| Rebuilt
|
| 3
| 1 Ea
| Branson Model L2200 Plasma Stripper, 2 ea composite ceramic/aluminum chambers for 4-8" wafers, low particulate, cassette to cassette operation, computer controlled, robot/indexer loader/unloader, ENI 1000W solid state RF Generator.
| Rebuilt
|
| 4
| 1 Ea
| Branson Model L3200 Plasma Stripper, 2 ea quartz chambers for 3-6" wafers, low particulate, cassette to cassette operation, computer controlled, robot/indexer loader/unloader, ENI 1000W solid state RF Generator.
| Rebuilt
|
| 5
| 2 Ea
| Branson/IPC Model S2100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 3 ea gas inputs, with Model 2000C 3 channel process programmer, with temperature controller, Model PM112 1000W RF Generator.
| Rebuilt
|
| 6
| 2 Ea
| Branson/IPC Model S3100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 1 ea gas input, with Model 4000C 1 channel process programmer, Model PM112 1000W RF Generator.
| Rebuilt
|
| 7
| 2 Ea
| Branson/IPC Model S4100, 1 ea 12" (dia) x 20"(Depth) quartz barrel, 2 ea gas inputs, with Model 4000C 1 channel process programmer, Model PM112 1000W RF Generator.
| Rebuilt
|
| 8
| 2 Ea
| Branson/IPC Model S4150, 1 ea 16" (dia) x 30"(Depth) aluminum barrel, 10.5" dia x 24" depth faraday cage, 2 ea gas inputs, single channel process programmer, Model PM112 1000W RF Generator.
| Rebuilt
|
| 9
| 2 Ea
| Branson/IPC Model S7150, 1 ea 24" (dia) x 36"(Depth) aluminum chamber, 4 ea gas inputs, 3 channel controller, Model PM132 1500W RF Generator.
| Rebuilt
|
| 10
| 2 Ea
| Branson/IPC Model 2000, 1 ea 10" (dia) x 20"(Depth) quartz barrel, 3 ea gas inputs, with Model 921C 3 channel process programmer, with Model 921C temperature controller, Model PM119 500W RF Generator.
| Rebuilt
|
| 11
| 2 Ea
| Branson/IPC Model 4000, 2 ea 10" (dia) x 20"(Depth) quartz barrel, 2 ea gas inputs, with Model 9906U-4 single channel process programmer, Model PM112 1000W RF Generator.
| Rebuilt
|
| 12
| 2 Ea
| Branson/IPC Model 3000, 1 ea 8" (dia) x 13"(Depth) quartz chamber, 1 ea gas input single channel, Model PM119 500W RF Generator @ 13.56 MHz.
| Rebuilt
|
| 13
| 1 Ea
| Branson/IPC Model 4055 Plasma Surface Treatment/Cleaning syste, 5 ea 7" dia. X 17" depth aluminum trays, 2 ea gas inputs, single channel, Model PM 119 RF Generator, 500W @ 13.56MHz.
| Rebuilt
|
| 14
| 1 Ea
| Branson/IPC Model 4000, 1 ea 10" (dia) x 20"(Depth) quartz chamber, 2 ea gas inputs, single channel, Model PM119 500W @ 13.56MHz RF Generator.
| Rebuilt
|
| 15
| 2 Ea
| D&W Model 425 plasma etcher, 28" dia electrode for 2-5" wafers or flat panels, 3 ea mass flow gas inputs, 3 ea regulator controlled gas inputs, 4 channel digital controller, 3000W RF Generator @ 13.56MHz.
| Rebuilt
|
| 16
| 3 Ea
| Drytek Megastrip VI, for 5-6" wafers, batch type stripper, 2 gas inputs, single channel, Advanced Energy Model PE 1650 (Rev C) RF Generator, 1400W @ 25-100KHz
| Rebuilt
|
| 17
| 1 Ea
| Electrotech Model STS310/15 Plasma Nitride Deposition tool, 30 cm dia table, 8 ea gas inputs, PC controlled, self diagnostics, RF PP RFX600 RF Generator
| Rebuilt
|
| 18
| 1 Ea
| Gasonics/IPC Model 9104 Plasma Asher/Etcher, 1 ea 12 x 20" quartz chamber, low particulate, 4 ea mass flow gas inputs, computer controlled w/ 486 PC, temp controller, ENI Model OEM 12AB 1000W solid state RF Generator
| Rebuilt
|
| 19
| 1 Ea
| Leybold Model Z410S RIE/PE etcher, load-lock, pallet capable of handling up to 200mm wafer, can select power to bottom, top, or both electrodes, turbo pumped, MKS throttle valve, Xinix End Point Detector, 4 ea mass flow gas inputs, PLC/computer controlled, w/ ENI OEM6 RF Generator,
| Rebuilt
|
| 20
| 3 Ea
| LFE Model PFS/PcrE/PDS-501, 1 ea 10" (dia) x 18" (depth) quartz chamber, 3 ea gas inputs, 3 channels
| Rebuilt
|
| 21
| 1 Ea
| LFE Model PALE-301, for 3-4" wafers, single wafer parallel plate aluminum etcher, 2 ea gas inputs, 2 channels, 300W RF Generator
| Rebuilt
|
| 22
| 1 Ea
| LFE Model PALE-301, 1 ea 5" dia x 6" depth quartz chamber, 1 ea gas input, single channel, auto logic, auto tuning, 300W RF Generator
| Rebuilt
|
| 23
| 1 Ea
| Plasma Etch Model PE-1000 plasma surface treatment system, 23.75"W x 54.25L x 11"H aluminum chamber, automated system with conveyor, 1000W RF generator @ 13.56MHz, 2 ea mass flow controllers, PC computer controlled.
| Rebuilt
|
| 24
| 1 Ea
| Plasma Therm Model # System, VII 72, S/N PTI-4330M(05), 7/90, 11" dia electrode, configured for RIE, single chamber, Plasma Therm Model MSC-70 programmable controller/sequencer, RFPP Model RF5S RF Generator, 500W @ 13.56MHz w/ RFPP Model AM-5 matching network, w/ controller, MKS Model 252 Exhaust valve controller, w/ Throttle Valve, 6 ea Brooks mass flow controllers currently installed (can accept up to 8 MFC's), Tek Temp Model TKD-100 chiller (4000 BTU/hr), Power Distribution Assy, 208/240VAC, 3 Ph/60Hz/60A, Alcatel Model 2033C/RSV 300 pump/blower package.
| Rebuilt
|
| 25
| 1 Ea
| Technics Plasma RIB Etch 160-ECR LL Powercool, R&D Ion Beam Etcher w/ load lock, filament free ECR ion source, PC controlled, IBE, RIBE, and CAIBE modes of operation for etching III/V semiconductor compounds, silicon compounds, metals, and dielectrics, currently operational and can be demonstrated. New cost $800K +.
| Rebuilt
|
| 26
| 1 Ea
| Technics Model PE-IIA plasma etcher, 11" parallel plate, w/ deposition option, for 2-4" wafers, 2 ea gas inputs, 500W RF Generator @ 30 KHz, auto/manual logic,
| Rebuilt
|
| 27
| 1 Ea
| Tegal Model 965 Plasma Asher/Stripper system for up to 6" wafers, batch type, 1 ea gas input, 9 ea process recipe storage, auto logic, auto tuning, 500W RFPP solid state RF Generator
| Rebuilt
|
| 28
| 1 Ea
| Tegal Model 803 Plasma Oxide Etcher, for 4" wafers, single wafer cassette to cassette, 4 ea gas inputs, two channels, ENI 1 KW RF Generator, auto logic/tuning.
| Rebuilt
|
| 29
| 2 Ea
| Tegal Model 701 Plasma Poly Etcher, for 4" wafers, single wafer cassette to cassette, 4 ea gas inputs, two channels, 300W RF Generator, auto logic/tuning.
| Rebuilt
|
| 30
| 2 Ea
| Tegal Model 421, for 2-4" wafers, batch type stripper/nitride etcher, 2 ea gas inputs, two channel, Preheating capability, manual tuning, auto/manual logic, 300W RF Generator.
| Rebuilt
|
| 31
| 2 Ea
| Tegal Model 415, for 2-4" wafers, batch type stripper, 1 ea gas input, single channel, auto tuning, auto/manual logic, 300W RF Generator.
| Rebuilt
|
| 32
| 3 Ea
| Tegal Model 411, for 2-4" wafers, batch type stripper, single gas input, single channel, 300W RF Generator, manual matching network.
| Rebuilt
|
| 33
| 3 Ea
| Tegal Model 211, for 2-3" wafers, batch type stripper, 1 ea gas input, single channel, 300W RF Generator.
| Rebuilt
|
R&D Semiconductor Equipment . . . For Sale!!!
Note: The following equipment were purchased new are slightly used for R&D application only. The number of substrates processed is very minimal, so, all equipment are in very good condition. Ages are more or less 5 years old.
| Item
| Equipment
| Model
| Notes
| Voltage/Current
| Dimensions
|
| 1
| SK Vapor Dryer
| 51028
| IPA Dryer
| 240V/70A
| 45W X 24D X 100H
|
| 2
| AEP Stripper
| UC-7550
| Flat Panel Stripper
| 208V/200A
| 74W X 50D 94H
|
| 3
| O3 Detector
| IN 2000-3
| Ozone Monitor
| 120V/1.5A
| N/A
|
| 4
| Steag Wet Etch
| FPD-400
| Wet Etch with Robot
| 208V/60A
| 71W X 51L X 65H
|
| 5
| AKT RIE
| 1600-ETCH
| 2 Etch Chambers
| 208V/240A
| Cluster Tool
|
| 6
| AKT PVD
| 1600-PVD
| 2 Sputter Chambers
| 208V/320A
| Cluster Tool
|
| 7
| Steag Coater
| FPD 400
| Resist Coater/Developer
| 208V/175A
| 115W X 82D X 73H
|
| 8
| Tamarack
| T-300
| Photo Lithography Tool
| 208V/15A
| 67W X 59D X 103H
|
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